Triple nitrogen-vacancy centre fabrication by C5N4Hn ion implantation
Moriyoshi Haruyama et al.
Fig. 4, panel (c)
Distribution of the separation distance (nm) between two nitrogen atoms implanted at the same point: normalised occurrence in 0.5 nm bins.
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This panel was reproduced from the authors' public data deposit (Nature Communications Source Data: https://doi.org/10.1038/s41467-019-10529-x, CC BY 4.0). The plot shown here is re-rendered for interactive viewing and analysis. See the paper for the original figure and full scientific context.
License: CC BY 4.0.
Nat. Commun. 10, 2664 (2019) · DOI: 10.1038/s41467-019-10529-x
Other panels of Fig. 4: (a) (b)
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